Deadline to submit abstracts has been extended to November 1, 2021
The Process Control Division encourages the submission of abstracts on all topics related to process measurement and control. These include: WIS and machine vision; analytics and monitoring, MD and CD control, measurement technologies, field devices, QCS, and DCS, etc.
Abstract suggested topics include:
• Field Devices
• Cross-Directional (CD) Measurement and Control
• Applications of Artificial Intelligence (AI) for Process Control
• Bridging the Gap Between QCS and Quality Lab